| http://www.w3.org/ns/prov#value | - low temperature plasma deposition of an optical absorption layer and high speed optical annealingUS713735422 Ago 200321 Nov 2006Applied Materials, Inc.Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltageUS71415142 Feb 200528 Nov 2006Applied Materials, Inc.Selective plasma re-oxidation process using pulsed RF source powerUS714
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