| http://www.w3.org/ns/prov#value | - A lithographic resist composition for use with deep UV light of less than 300 nm wavelength comprising a base soluble film-forming polymer and in admixture therewith as a deep UV photosensitive solubilizing agent, a sufficient quantity of an oligomeric compound of the formula ##STR10## wherein X is ##STR11## and n is a whole positive integer such that the molecular weight of the oligomeric compoun
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