| http://www.w3.org/ns/prov#value | - lid state zone recrystallization of semiconductor material on an insulator* Cited by examinerReferenced byCiting PatentFiling datePublication dateApplicantTitleUS5863659 *Mar 24, 1997Jan 26, 1999Shin-Etsu Handotai Co., Ltd.Silicon wafer, and method of manufacturing the sameUS5970365 *Mar 24, 1997Oct 19, 1999Shin-Etsu Handotai., Ltd.Silicon wafer including amorphous silicon layer formed by PCVD and
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