| http://www.w3.org/ns/prov#value | - licon carbonitride and silicon oxycarbonitride filmsUS7786320May 12, 2009Aug 31, 2010Advanced Technology Materials, Inc.Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideUS7863203Jan 24, 2008Jan 4, 2011Advanced Technology Materials, Inc.Monosilane or disilane derivatives and m
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