| http://www.w3.org/ns/prov#value | - If this is the case, it suffices to provide a mechanism for discharging residual resist solution, such as a cup, below the wafer 1, toreceive the residual resist solution.Moreover, the mask member may be of any one of the types shown in FIGS. 11A to 11D. If so, the apparatus can be made smaller.Additional advantages and modifications will readily occur to those skilled in the art.
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