| http://www.w3.org/ns/prov#value | - 20130216961COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN - A composition for forming an upper layer film includes a solvent and a resin component including a first resin having a first repeating unit and a second repeating unit.
|
