About: http://webisa.webdatacommons.org/321436753

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Etch stop layer 12 is typically formed of an oxide material, such as silicon dioxide, a silicon nitride or a silicon oxynitride, and can be deposited in a conventional manner, as by CVD and may comprise silicon nitride.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es