| http://www.w3.org/ns/prov#value | - Thus, one kind or plural kinds of films selected from the group consisting of a polysilicon film, WSix (x=2.0 to 2.8) film, and a film made of a conductive material such as Al, Ta, W, Cr, or Mo may be used as the lower light shielding film (FIG. 2A). [0097] Subsequently, a base insulating film 302 is formed on the lower light shielding film 301.
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