| http://www.w3.org/ns/prov#value | - treatment, forming overlap regions 533 to 536. (See FIG. 23(D).) A second interlayer insulating film 937 is formed with an average film thickness of 1.0 to 2.0 ??m using an inorganic insulating material such as silicon oxide or silicon nitride oxide, or by using an organic insulating material.
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