| http://www.w3.org/ns/prov#value | - Specifically, FIG. 5B is a view in which the resist mask has become about the same as in FIG. 4B. It is seen that in FIG. 5B, the etching of the second hard mask 54 is advanced by as much as Y nm in comparison with that of FIG. 4B. This step is stopped as soon as the first hard mask 53 is exposed.
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