About: http://webisa.webdatacommons.org/326550967

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The resist lower layer film of the present invention is excellent especially in etching resistance in the dry etching using a gas mainly containing any one of chlorofluocarbon gas, chlorine gas and bromine gas.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com