About: http://webisa.webdatacommons.org/327105296

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The insulating film 210 is formed using an insulating material such as silicon oxide, silicon nitride, silicon oxynitride (SiOxNy (x>y)), or silicon nitride oxide (SiNxOy (x>y)) by CVD, sputtering, or the like.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com