About: http://webisa.webdatacommons.org/327346086

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention is a method of trimming a photoresist mask on a substrate in a semiconductor substrate processing system.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com