| http://www.w3.org/ns/prov#value | - An advantage of the CMP machine 310 shown in FIG. 5 is that the electrical contacts 352 a and 352 b do not contact the planarizing liquid 123 or the polishing pad 121, virtually eliminating the possibility that the contacts will become contaminated with particulate matter or other substances contained in the planarizing medium 128.
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