PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • BACKGROUND OF THE INVENTION In a typical ion implanter, a relatively small cross-section beam of dopant ions is scanned relative to a silicon wafer or other substrate.
http://www.w3.org/ns/prov#wasQuotedFrom
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