| http://www.w3.org/ns/prov#value | - Furthermore, two types of quartz plates 121 and 125 may disposed as shown in FIG. 27, to correct the difference in etching rateintrinsic to the etching apparatus explained in Embodiments 5 and 6.As the method of measuring the phase shifting amount of the phase shifter, a profilometer method or an optical phase difference measuring method may be used other than AFM described in this embodiment.(Emb
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