| http://www.w3.org/ns/prov#value | - US6534416 *Aug 11, 2000Mar 18, 2003Applied Materials Inc.Control of patterned etching in semiconductor featuresUS6540014Feb 29, 2000Apr 1, 2003Temptronic CorporationThat hold workpieces such as semiconductor wafers and control the temperature of the workpieces; mechanical stresses on the chuck and resulting deformation of the chuck and workpiece over temperature are eliminatedUS6548111Nov 21, 2000
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