| http://www.w3.org/ns/prov#value | - 82Aug 22, 2003Dec 4, 2007Applied Materials, Inc.Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltageUS7320734Aug 22, 2003Jan 22, 2008Applied Materials, Inc.Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltageUS7393765Apr 19, 2007Jul 1, 2008Appl
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