| http://www.w3.org/ns/prov#value | - As with the previously discussed species embodiment, the cell shown in FIGS. 3a, 3b and 3c can also be fabricated with alternate materials, but a preferred silicon based embodiment is as follows: The following processes are performed on a P type substrate 58P. A first mask is used to form the deep trenches 41c, 41d and 41e using a suitable means such as reactive ion etching.
|
