About: http://webisa.webdatacommons.org/337653151

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Regarding polishing of the semiconductor insulating film using it, however, the polishing rate is low and defects such as scratches, orange peels, etc. are formed on the polished surface.
http://www.w3.org/ns/prov#wasQuotedFrom	patents.com