About: http://webisa.webdatacommons.org/34179659

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Subsequently, an etching gas mainly composed of a fluorine-containing gas containing at least one hydrogen atom in the molecule, e.g. CHF3, is used instead, so that incident ion damages on the underlying layer can be suppressed.
http://www.w3.org/ns/prov#wasQuotedFrom	freepatentsonline.com