| http://www.w3.org/ns/prov#value | - The source/drain electrodes 104 a, 104 b are formed after deposing an inorganic material such as SiNx or SiOx, an amorphous silicon, and an impurity amorphous silicon by PCVD (plasma chemical vapor deposition) method, and patterning the data bus line 102 in order to have holes (S2).
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