About: http://webisa.webdatacommons.org/343261318

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Another advantage of the present invention is a method of manufacturing a semiconductor device having interconnect patterns exhibiting reduced parasitic R???C time delays employing dielectric materials having a low dielectric constant.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com