| http://www.w3.org/ns/prov#value | - er and high speed optical annealingUS713735422 Aug 200321 Nov 2006Applied Materials, Inc.Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltageUS71415142 Feb 200528 Nov 2006Applied Materials, Inc.Selective plasma re-oxidation process using pulsed RF source powerUS714521923 Dec 20045 Dec 2006Reveo, Inc.Vertical integrated circuit
|
