| http://www.w3.org/ns/prov#value | - eto.In accordance with the invention, a method for fabricating free-standing nanostructures includes: providing a semiconductor wafer including a substrate and a patterned layer above the substrate, the patterned layer comprising a plurality ofopenings ranging from the surface of the patterned layer to the surface of the substrate and structural elements being arranged within the openings, providi
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