| http://www.w3.org/ns/prov#value | - ethod appropriately selected, in consideration of the suitability to the material constituting the anode, for example, from wet methods such as printing and coating, physical methods suchas vacuum deposition, sputtering and ion plating, and chemical methods such as CVD and plasma CVD. For example, when ITO is selected as the material for anode, formation of the anode can be carried out by DC sputt
|
