| http://www.w3.org/ns/prov#value | - etal, R is a single element selected from the group consisting of tungsten, aluminum and silicon, and S is a single element selected from the group consisting of nitrogen and oxygen; provided that R is not the same element as Q; forming a first capacitor electrode separated from the polysilicon interconnect by the diffusion barrier layer; forming a dielectric layer proximate the first capacitor el
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