| http://www.w3.org/ns/prov#value | - e electrode plate and the wiper. [0270] This means that the electrode and the wiper can be adjusted for improving the electro-chemical machining. [0271] Also, this embodiment is particularly useful for such applications that wiping should be performed preferably some time after electrolytic reaction by controlling, e.g. the number of revolution of the wafer to adjust the electrolytic removing spee
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