| http://www.w3.org/ns/prov#value | - er or an lcd substrate, to a plasma process, such as an etching process or the like.US6016131May 3, 1999Jan 18, 2000Applied Materials, Inc.Inductively coupled plasma reactor with an inductive coil antenna having independent loopsUS6043608Oct 31, 1997Mar 28, 2000Nec CorporationPlasma processing apparatusUS6089182Sep 30, 1997Jul 18, 2000Tokyo Electron LimitedPlasma processing apparatusUS6093457Mar 2
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