| http://www.w3.org/ns/prov#value | - ep 2008Applied Materials, Inc.Processing chamber configured for uniform gas flowUS742940210 Dic 200430 Sep 2008Applied Materials, Inc.Depositing a barrier layer on the substrate, such as a titanium or tantalum containing barrier layer and depositing a ruthenium layer on the barrier layer; depositing a tungsten nucleation layer on the ruthenium layer and depositing a tungsten bulk layer on the tung
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