| http://www.w3.org/ns/prov#value | - Referring to FIGS. 20 and 21, a photosensitive organic material having a good flatness characteristic, or a low dielectric insulating material such as a-Si:C:O and a-Si:O:F formed by plasma enhanced chemical vapor deposition (PECVD) is deposited on the first interlayer insulating layer 601 having the source electrodes 173 d, 173 n and 173 p and drain electrodes 175 d, 175 n and 175 p, to form a se
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