| http://www.w3.org/ns/prov#value | - er the substrate having an amorphous silicon film is taken out from the chamber, or may be performed continuously in the chamber without taking out the substrate.After the process (4), when an intense light such as a laser is irradiated to the silicon film, a portion of the silicon film which is not completely crystallized by a solid phase growth can be crystallized, so that a crystalline silicon
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