| http://www.w3.org/ns/prov#value | - Recently, in a lithographic process that manufactures a semiconductor element, a liquid crystal display element, etc., a step-and-scan type scanning exposure apparatus (so-called scanning stepper (scanner)) often is used that synchronously moves a mask or a reticle (hereafter referred to as ???reticle???) and a photosensitive object such as a wafer or a glass plate (hereafter referred to as ???waf
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