About: http://webisa.webdatacommons.org/353830653

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	More specifically, the present invention relates to a method of forming an oxynitride film or the like on an object to be processed, such as a semiconductor wafer, and a system for carrying out the same.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com