About: http://webisa.webdatacommons.org/355267126

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	An insulating film including silicon is formed as the second gate insulating film 512 to have a thickness of 20 nm to 150 nm by a plasma CVD method or a sputtering method.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com