| http://www.w3.org/ns/prov#value | - Naturally, the first interlayer insulating film 461 is not limited to the silicon oxynitride film but other insulating film including silicon may be used as a single layer or a laminated structure. [0187] Next, as shown by FIG. 10A, there is carried out a step of activating the impurity elements added to the respective semiconductor layers.
|
