| http://www.w3.org/ns/prov#value | - Further, the imprint pattern may, e.g., be formed by electron beam lithography.(E: Substrate and Pattern Formation Material)Next, the substrate and the pattern formation material according to this embodiment will be described.As the substrate, it is possible to use semiconductor substrates including Si substrate, GaAs substrate, etc.; resin substrate; quartz substrate; glass substrate; etc.
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