| http://www.w3.org/ns/prov#value | - Naturally, the first interlayer insulating film 161 is not limited to the silicon oxynitride film but other insulating film including silicon may be used as a single layer or a laminated structure. [0144] Next, as shown by FIG. 13B, there is carried out a step of activating the impurity elements added to the respective semiconductor layers.
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