About: http://webisa.webdatacommons.org/361048914

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Accordingly, there is a need for an improved CMP apparatus that enables better control of the polishing rate and the selectivity of the polish rate across different layers.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com