About: http://webisa.webdatacommons.org/36507162

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	At 812, an etch can be performed on the dielectric cap and hard mask layers, whereby the ArF resist layer is stripped in-situ, in order to achieve a configuration such as is depicted with regard to FIG. 6.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com