| http://www.w3.org/ns/prov#value | - It should be noted that there is ordinarily present a diffused N+ region in all thin oxide regions that are not covered by polysilicon, such as between each of the two electrodes 44(SE+ and SE-) forming a split electrode configuration, produced by virtue of the diffusion step for N+ diffused regions 21 and 61, but this does not materially affect the operation.
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