| http://www.w3.org/ns/prov#value | - It should be understood that with second mirror region 114 being made of a material, such as gallium arsenide, aluminum gallium arsenide, or the like, a large selectivity is provided by using oxygen that etches or removes exposed portions of planarization layer 320, thus allowing long periods of etching or overetching without damaging second mirror region 114.
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