About: http://webisa.webdatacommons.org/37334764

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	In place of the gas mixture of Cl2 and O2, a gas mixture of another halogen gas such as HBr, SF6, or HCl and O2 may be used as the etching gas.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com