About: http://webisa.webdatacommons.org/373708685

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Our chamber 16 is capable of processing substrates including semiconductor wafers, by deposition and/or etching, using total chamber pressures of about 0.1 mtorr to about 50 torr, and, for etching, typically 0.1 mtorr to 200 mtorr.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com.au