| http://www.w3.org/ns/prov#value | - The insulating layer is formed to have a single layer or a lamination layer of a layer containing an inorganic material such as silicon, an oxide of silicon, or a nitride of silicon (which may be referred to as an inorganic layer); or a layer containing an organic material such as organic resin (which may be referred to as an organic layer) by a known method (plasma CVD or sputtering method).
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