PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • Thus, the oxidant, such as oxygen or nitrous oxide, may be provided at a stoichiometric rate or at an excess, throughout the deposition, to react with the dielectric material precursors being provided to the deposition apparatus.
http://www.w3.org/ns/prov#wasQuotedFrom
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