About: http://webisa.webdatacommons.org/376278772

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The target is electrically isolated from the chamber and serves as a process electrode for generating a sputtering plasma During the sputtering process, a sputtering gas, such as argon or xenon, is introduced into the chamber 36.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com