About: http://webisa.webdatacommons.org/376363176

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Then, the trench is filled with the metal film and the polysilicon film by planarizing the metal film 42 and the polysilicon film 40 using a planarizing process such as an etch back process or chemical mechanical polishing (CMP).
http://www.w3.org/ns/prov#wasQuotedFrom	google.com