| http://www.w3.org/ns/prov#value | - The dielectric structure may act as a single dielectric layer, and is formed by depositing the various metal oxides by atomic layer deposition onto a substrate surface using precursor chemicals containing zirconium compounds, followed by a purge and deposition of an oxidizing material such as ozone, hydrogen peroxide or water vapor to form a thin (often a single molecular layer) film of ZrO2.
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