| http://www.w3.org/ns/prov#value | - (5) A part of the surface of the monocrystalline Si layer 58 which is exfoliated by the hydrofluoric acid etchant as required, furthermore it is etched with etchant by the hydrogen annealing process and the monocrystalline Si layer 58 is formed with desired thickness and even characteristics, for example 1 ??m.
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